Gases used in the semiconductor industry are collectively referred to as electronic gases.
It can be divided into three categories: pure gas, high purity gas and semiconductor special material gas.
Special material gases are mainly used in epitaxial, doping and etching processes, and high purity gases are mainly used as dilution gases and carrier gases.
Electronic gas is an important branch of special gas. It is also an indispensable raw material for the electronic industry such as VLSI, planar display device, compound semiconductor gas, solar cell, fiber etc.
Its purity and cleanliness directly affect the quality, integration, specific technical index and finished productivity of photoelectronic and microelectronic components, and fundamentally restrict the accuracy and accuracy of circuits and gas components.
In recent years, with the rapid development of VLSI, flat panel display and other industries in Taiwan, the demand for electronic gas has increased significantly.
氬氣(Ar)
Ar is used in factories where plasma deposition and etching processes are used, and in deep ultraviolet microlasers, the smallest patterns on semiconductor chips.Liquefied argon droplets are increasingly used to clean the smallest and most vulnerable chip structures.
二氧化碳(CO2)
CO2 can be used in advanced wet micro-image technology, special low temperature cleaning application and DI treatment.
氦氣(He)
He is the second lightest element and the coldest liquid used in electronic manufacturing for cooling, plasma processing, and leakage inspection.
氫氣(H2)
Due to the larger manufacturing plant and more advanced process requirements, H2 usage is increasing for epitaxial deposition and surface treatment of silicon and silicon germanium.Hydrogen demand will continue to grow as EUV (ultra-ultraviolet light) changes.Lianwald is ready to supply hydrogen either in compressed gas or liquid form (in the United States and Europe only) or in-situ hydrolysis with water vapor
氧氣(O2)
O2 is used to produce oxide layers during etching.Ultra-pure liquid oxygen (LOX) with less than 10 ppb impurities is available on site and no external purifier is required.
氮氣(N2)
N2 is the most widely used gas in semiconductor manufacturing. It is used to blow clean vacuum pump, discharge system, and can also be used as process gas.In large advanced plant areas, nitrogen consumption can reach 50,000 cubic meters per hour, forcing the plant to require cost-effective, low-energy on-site nitrogen machine.
笑氣(N2O)
Nitrogen-containing thin films such as silicon dioxide and silicon oxide were grown.Chemical vapor deposition and atomic layer deposition
高純度二氧化碳(CO2)
Infiltration micro-image process: Removal of static electricity in cleaning process, use as laser source in deep polar ultraviolet lithography
四氟化碳(CF4)
Carbon tetrafluoride is sometimes used as a cryogenic coolant.It is used as a gas etchant and plasma etch plate.
